MicroSplat的Tessellation和Parallax模块为MicroSplat框架增加了几项新功能。
Tessellation and Parallax v2.1功能：
具有位移映射的曲面细分
视差偏移映射，为曲面细分或非镶嵌地形增加深度效果
每纹理强度控制可用于控制位移量，位移方向，位移偏移和视差量，未使用的效果在着色器之外进行优化，无需任何成本。
MicroSplat曲面细分非常快，启用后会生成在曲面细分范围之外使用的自定义回退着色器，从而进一步降低成本。
需要安装MicroSplat框架
Tessellation and Parallax v2.1更新日志：
– Upgrade note: TextureArrayConfig texture settings refactored, so all settings will be reset to default on upgrading.
– Ability to pack Smoothness/AO separately from normals (for higher quality, but slower speed)
– Option to size source textures on array compile. This will reduce the source textures to either 256 or 32 pixels in size saving memory in builds.
– You can now force texture compression formats to DXT, ATSC, PVR, and ETC2
– You can now override the texture settings on a per-platform basis, allowing for scaled textures or different compression formats on each platform
– When computing texture array hash, resulting texture compression format is hashed instead of platform choice. This should let people working on mac/pc not recompress the arrays on a regular basis, since those platforms should result in the same compression format.
